Surface passivation of boron emitters on n-type c-Si solar cells using silicon dioxide and a PECVD silicon oxynitride stack-Reference-Cited by-同舟云学术

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Surface passivation of boron emitters on n-type c-Si solar cells using silicon dioxide and a PECVD silicon oxynitride stack

Published:2016 Issue:74 Volume:6 Page:70040-70045
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Balaji Nagarajan¹²³⁴,Lee Seunghwan⁵²³⁴,Park Cheolmin¹²³⁴,Raja Jayapal⁵²³⁴,Thanh Nguyen Huong Thi⁵²³⁴,Chatterjee Somenath⁶⁷⁸⁹¹⁰,Nikesh K.¹¹¹²¹³¹⁴¹⁰,Jeyakumar R.¹⁵¹⁶¹⁷¹⁰,Yi Junsin¹²³⁴⁵

Affiliation:

1. Department of Energy Science

2. Sungkyunkwan University

3. Suwon

4. Republic of Korea

5. College of Information and Communication Engineering

6. Department of Electronics and Communication Engineering

7. Sikkim Manipal Institute of Technology

8. Sikkim Manipal University

9. Sikkim 737102

10. India

11. Department of Electrical and Electronics Engineering

12. Rajalakshmi Engineering College

13. Anna University

14. Chennai-602105

15. Physics of Energy Harvesting Division

16. CSIR-National Physical Laboratory

17. New Delhi 110 012

Abstract

Recombination of charge carriers is a significant loss mechanism in solar cells.

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2016/RA/C6RA11043F

Reference27 articles.

1. Surface Passivation Schemes for High-Efficiency c-Si Solar Cells - A Review

2. Recent advances of high-efficiency single crystalline silicon solar cells in processing technologies and substrate materials

3. Chemical HF Treatment for Rear Surface Passivation of Crystalline Silicon Solar Cells

4. Record low surface recombination velocities on 1 Ω cm p‐silicon using remote plasma silicon nitride passivation

5. Silicon nitride and oxynitride films

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3. SiOxNy back-contact barriers for CZTSe thin-film solar cells;PLOS ONE;2021-01-12

4. SiN/SiO2 passivation stack of n-type silicon surface;Materials Science-Poland;2019-09-01

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