Epitaxial lateral overgrowth of AlN on self-assembled patterned nanorods
Author:
Affiliation:
1. Tyndall National Institute
2. University College Cork
3. Cork
4. Ireland
5. Materials Chemistry & Analysis Group
6. School of Engineering
7. Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN)
Abstract
We report an inexpensive nanoscale patterning process for epitaxial lateral overgrowth (ELOG) in AlN layers grown by metal organic vapour phase epitaxy (MOVPE) on sapphire.
Publisher
Royal Society of Chemistry (RSC)
Subject
Materials Chemistry,General Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2015/TC/C4TC01536C
Reference32 articles.
1. Some Properties of Aluminum Nitride
2. Epitaxial growth of high quality AlN films on metallic aluminum substrates
3. Epitaxial growth of 2 inch diameter homogeneous AlN single-crystalline films by pulsed laser deposition
4. 222-282 nm AlGaN and InAlGaN-based deep-UV LEDs fabricated on high-quality AlN on sapphire
5. Modulated Epitaxial Lateral Overgrowth of AlN for Efficient UV LEDs
Cited by 58 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Fabrication of high-quality Al-polar and N-polar AlN templates through self-forming tiny-pit layers and polarity inversion;Journal of Applied Physics;2024-07-11
2. Efficient Deep Ultraviolet Emission from Self-Organized AlGaN Quantum Wire Array Grown On Ultrathin Step-bunched AlN Templates;Crystal Growth & Design;2023-12-06
3. Bright Deep Ultraviolet Luminescence from Semipolar AlGaN Multiple Quantum Wells Grown on Dislocation-Free Crystal Grains;2023 20th China International Forum on Solid State Lighting & 2023 9th International Forum on Wide Bandgap Semiconductors (SSLCHINA: IFWS);2023-11-27
4. Evolution of microstructure, stress and dislocation of AlN thick film on nanopatterned sapphire substrates by hydride vapor phase epitaxy;Chinese Physics B;2023-02-01
5. The optimal threading dislocation density of AlN template for micrometer-thick Al0.63Ga0.37N heteroepitaxy;Journal of Crystal Growth;2022-12
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3