Influence of removing PMMA residues on surface of CVD graphene using a contact-mode atomic force microscope-Reference-Cited by-同舟云学术

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Influence of removing PMMA residues on surface of CVD graphene using a contact-mode atomic force microscope

Published:2017 Issue:12 Volume:7 Page:6943-6949
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Choi Woosuk¹²³⁴⁵,Shehzad Muhammad Arslan¹²³⁴⁵,Park Sanghoon¹²³⁴⁵,Seo Yongho¹²³⁴⁵^ORCID

Affiliation:

1. Department of Nanotechnology

2. Advanced Material Engineering

3. Graphene Research Institute

4. Sejong University

5. Seoul

Abstract

AFM cleaning technique can be a potential tool to clean the surface defects of 2D materials like TMDs, as well as graphene.

Funder

Ministry of Trade, Industry and Energy

National Research Foundation of Korea

Korea Institute of Energy Technology Evaluation and Planning

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2017/RA/C6RA27436F

Reference39 articles.

1. Electric Field Effect in Atomically Thin Carbon Films

2. Synthesis of Patched or Stacked Graphene and hBN Flakes: A Route to Hybrid Structure Discovery

3. Photovoltaic effect in few-layer black phosphorus PN junctions defined by local electrostatic gating

4. Anisotropic thermoelectric behavior in armchair and zigzag mono- and fewlayer MoS2 in thermoelectric generator applications

5. High-quality sandwiched black phosphorus heterostructure and its quantum oscillations

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