Synergistic combination of amorphous indium oxide with tantalum pentoxide for efficient electron transport in low-power electronics
Author:
Affiliation:
1. Department of Energy Engineering
2. Ulsan National Institute of Science and Technology (UNIST)
3. Ulsan 44919
4. South Korea
5. Department of Physics
6. Department of Chemistry
7. Kyung Hee University
8. Seoul 02447
Abstract
High-quality amorphous indium oxide thin films are obtained by exploiting a synergistic interaction with an underlying tantalum pentoxide layer.
Funder
National Research Foundation of Korea
Publisher
Royal Society of Chemistry (RSC)
Subject
Materials Chemistry,General Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2019/TC/C9TC00054B
Reference37 articles.
1. The physics of amorphous-silicon thin-film transistors
2. Amorphous silicon thin-film transistors with 90° vertical nanoscale channel
3. Surface Engineering of Polycrystalline Silicon for Long-Term Mechanical Stress Endurance Enhancement in Flexible Low-Temperature Poly-Si Thin-Film Transistors
4. Oxide Semiconductor Thin-Film Transistors: A Review of Recent Advances
5. Metal oxides for optoelectronic applications
Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. First Review of Conductive Electrets for Low-Power Electronics;Journal of Low Power Electronics and Applications;2023-04-06
2. Reaction-inhibited interfacial coating between PEDOT:PSS sensing membrane and ITO electrode for highly-reliable piezoresistive pressure sensing applications;Journal of the Taiwan Institute of Chemical Engineers;2021-09
3. Enhancement of electrical properties of solution-processed oxide thin film transistors using ZrO2 gate dielectrics deposited by an oxygen-doped solution;Journal of Physics D: Applied Physics;2021-01-14
4. Ta2O5/SiO2 Multicomponent Dielectrics for Amorphous Oxide TFTs;Electronic Materials;2020-12-29
5. Influence of flexible substrate in low temperature polycrystalline silicon thin-film transistors: temperature dependent characteristics and low frequency noise analysis;Nanotechnology;2020-08-03
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3