Molybdenum precursor delivery approaches in atomic layer deposition of α-MoO<sub>3</sub>-Reference-Cited by-同舟云学术

Molybdenum precursor delivery approaches in atomic layer deposition of α-MoO₃

Published:2023 Issue:4 Volume:52 Page:902-908
ISSN:1477-9226
Container-title:Dalton Transactions
language:en
Short-container-title:Dalton Trans.

Author:

Lorenzo Daniela¹,Tobaldi David Maria¹^ORCID,Tasco Vittorianna¹^ORCID,Esposito Marco¹^ORCID,Passaseo Adriana¹,Cuscunà Massimo¹^ORCID

Affiliation:

1. CNR NANOTEC Institute of Nanotechnology, Via Monteroni, Lecce 73100, Italy

Abstract

We have developed a time-saving alternative plasma enhanced atomic layer deposition process for high-quality α-MoO3 thin films which are suitable for exfoliation.

Funder

Consiglio Nazionale delle Ricerche

Ministero dell'Università e della Ricerca

Publisher

Royal Society of Chemistry (RSC)

Subject

Inorganic Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2023/DT/D2DT03702E

Reference52 articles.

1. Combination of characterization techniques for atomic layer deposition MoO3coatings: From the amorphous to the orthorhombic α-MoO3crystalline phase

2. Molybdenum Oxides – From Fundamentals to Functionality

3. Hole Selective MoOx Contact for Silicon Solar Cells

4. Silicon heterojunction solar cell with passivated hole selective MoOx contact

5. Molybdenum oxide MoOx: A versatile hole contact for silicon solar cells

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