Thin V<sub>2</sub>O<sub>5</sub> films synthesized by plasma-enhanced atomic layer deposition for memristive applications-Reference-Cited by-同舟云学术

Thin V₂O₅ films synthesized by plasma-enhanced atomic layer deposition for memristive applications

Published:2023 Issue:46 Volume:25 Page:32132-32141
ISSN:1463-9076
Container-title:Physical Chemistry Chemical Physics
language:en
Short-container-title:Phys. Chem. Chem. Phys.

Author:

Antonova Irina V.¹²^ORCID,Seleznev Vladimir A.¹^ORCID,Nebogatikova Nadezhda A.¹^ORCID,Ivanov Artem I.¹^ORCID,Voloshin Bogdan V.¹^ORCID,Volodin Vladimir A.¹³^ORCID,Kurkina Irina I.⁴^ORCID

Affiliation:

1. Rzhanov Institute of Semiconductor Physics SB RAS, 13 Lavrentiev aven., Novosibirsk 630090, Russia

2. Novosibirsk State Technical University, 20 K. Marx str., Novosibirsk 630073, Russia

3. Physical Department, Novosibirsk State University, 1 Pirogov str., Novosibirsk 630090, Russia

4. Institute of Physics and Technologies, North-Eastern Federal University, 58 Belinsky str., Yakutsk 677027, Russia

Abstract

V2O5/Si structures with an average V2O5 thickness of 1.0–3.6 nm and orthorhombic phase demonstrate stable memristive switching with an ON/OFF ratio ∼1–4 orders of magnitude.

Funder

Russian Science Foundation

Publisher

Royal Society of Chemistry (RSC)

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Link

http://pubs.rsc.org/en/content/articlepdf/2023/CP/D3CP03761D

Reference58 articles.

1. Atomic layer deposition of vanadium oxide films for crystalline silicon solar cells

2. Ultrathin Oxide Films by Atomic Layer Deposition on Graphene

3. A brief review of atomic layer deposition: from fundamentals to applications

4. Electrospun V2O5 composite fibers: Synthesis, characterization and ammonia sensing properties

5. V2O5 thin films for gas sensor applications

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