Atomic layer deposition of vanadium oxide films for crystalline silicon solar cells-Reference-Cited by-同舟云学术

Atomic layer deposition of vanadium oxide films for crystalline silicon solar cells

Published:2022 Issue:1 Volume:3 Page:337-345
ISSN:2633-5409
Container-title:Materials Advances
language:en
Short-container-title:Mater. Adv.

Author:

Costals Eloi Ros¹^ORCID,Masmitjà Gerard¹^ORCID,Almache Estefania¹,Pusay Benjamin¹^ORCID,Tiwari Kunal²^ORCID,Saucedo Edgardo¹^ORCID,Raj C. Justin³,Kim Byung Chul⁴,Puigdollers Joaquim¹,Martin Isidro¹,Voz Cristobal¹,Ortega Pablo¹

Affiliation:

1. Electronic Engineering Department, Universitat Politècnica de Catalunya (UPC), 08034 Barcelona, Spain

2. Department of Advanced Materials for Energy, Catalonia Institute for Energy Research (IREC), 08930, Barcelona, Spain

3. Department of Chemistry, Dongguk University-Seoul, Jung-gu, Seoul-04620, Republic of Korea

4. Department of Advanced Components and Materials Engineering, Sunchon National University, 255, Jungang-ro, Sunchen-si, Jellanamdo, 57922, Republic of Korea

Abstract

We have fabricated n-type silicon solar cells using ALD deposited vanadium oxide as the front transparent contact.

Funder

H2020 European Research Council

Generalitat de Catalunya

Ministerio de Economía y Competitividad

Ministerio de Ciencia e Innovación

National Research Foundation of Korea

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science,Chemistry (miscellaneous)

Link

http://pubs.rsc.org/en/content/articlepdf/2022/MA/D1MA00812A

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