Shock wave and modelling study of the unimolecular dissociation of Si(CH3)2F2: an access to spectroscopic and kinetic properties of SiF2-Reference-Cited by-同舟云学术

Shock wave and modelling study of the unimolecular dissociation of Si(CH3)2F2: an access to spectroscopic and kinetic properties of SiF2

Published:2021 Issue:39 Volume:23 Page:22437-22442
ISSN:1463-9076
Container-title:Physical Chemistry Chemical Physics
language:en
Short-container-title:Phys. Chem. Chem. Phys.

Author:

Cobos C. J.¹^ORCID,Sölter L.²³^ORCID,Tellbach E.²³^ORCID,Troe J.²³^ORCID

Affiliation:

1. INIFTA, Facultad de Ciencias Exactas, Universidad Nacional de La Plata, CONICET, Argentina

2. Institut für Physikalische Chemie, Universität Göttingen, Tammannstrasse 6, D-37077 Göttingen, Germany

3. Max-Planck-Institut für Biophysikalische Chemie, Am Fassberg 11, D-37077 Göttingen, Germany

Abstract

Falloff curves of the unimolecular dissociation of Si(CH3)2F2 are determined in shock waves and compared to modelling results. High-temperature UV absorption cross sections of SiF2 are also derived.

Funder

Deutsche Forschungsgemeinschaft

Max-Planck-Gesellschaft

Publisher

Royal Society of Chemistry (RSC)

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Link

http://pubs.rsc.org/en/content/articlepdf/2021/CP/D1CP03298D

Reference23 articles.

1. Review Article: Reactions of fluorine atoms with silicon, revisited, again

2. Gas phase reactions of SiF2 with F2 and Cl2

3. Kinetics of SiF(X2Πr) by time-resolved molecular resonance absorption spectroscopy following the reaction of Si(33PJ, 31D2, 31S0), generated by pulsed irradiation, with fluorinated compounds

4. Etching reactions for silicon with F atoms: Product distributions and ion enhancement mechanisms

5. SiF2as a primary desorption product of Si etching by F atoms: Interpretation of laser‐induced fluorescence spectra; rate constant of the gas phase SiF2+F reaction

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