Study of the ordered assembly morphologies of diblock copolymers on the same substrate-Reference-Cited by-同舟云学术

Study of the ordered assembly morphologies of diblock copolymers on the same substrate

Published:2022 Issue:44 Volume:12 Page:28376-28387
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Zhang Baolin¹^ORCID,Meng Lingkuan²,Li Zili¹^ORCID

Affiliation:

1. School of Information Science and Technology, Fudan University, Shanghai 200433, China

2. Beijing Institute of Carbon-based Integrated Circuit, Yiyuan Cultural and Creative Industry Park, 80 Xingshikou Road, Haidian District, Beijing, 100089, China

Abstract

With the development of frontier technology in emerging semiconductor processes, directed self-assembly (DSA) of block copolymer has attracted great attention from scientific researchers and become promising candidate for advanced photolithography.

Funder

National Natural Science Foundation of China

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2022/RA/D2RA04803E

Reference45 articles.

1. Extreme ultraviolet resist materials for sub-7 nm patterning

2. Nanoporous block copolymer membranes immobilized with gold nanoparticles for continuous flow catalysis

3. Structural and Electrical Characterization of a Block Copolymer-Based Unipolar Nonvolatile Memory Device

4. Fabrication of conductive metallized nanostructures from self-assembled amphiphilic triblock copolymer templates: Nanospheres, nanowires, nanorings

5. Well-Organized CdS/C60in Block Copolymer Micellar Cores

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