Unique features of laterally aligned GeSi nanowires self-assembled on the vicinal Si (001) surface misoriented toward the [100] direction
Author:
Affiliation:
1. State Key Laboratory of Surface Physics and Department of Physics
2. Collaborative Innovation Center of Advanced Microstructures
3. Fudan University
4. Shanghai 200433, China
5. A*STAR Institute of High Performance Computing
6. , Singapore 138632
Abstract
Naturally aligned in-plane (without post-growth assembly), defect-free (without a metal catalyst) and controllable GeSi nanowires are discovered via self-assembly of Ge on miscut Si (001) substrates by an angle θ (θ < 11°) toward the [100] direction.
Funder
Agency for Science, Technology and Research
National Natural Science Foundation of China
Publisher
Royal Society of Chemistry (RSC)
Subject
General Materials Science
Link
http://pubs.rsc.org/en/content/articlepdf/2015/NR/C4NR07433E
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