Thermal atomic layer deposition of In2O3 thin films using a homoleptic indium triazenide precursor and water
Author:
Affiliation:
1. Department of Physics, Chemistry and Biology, Linköping University, SE-581 83 Linköping, Sweden
Abstract
Funder
Swedish Institute
Stiftelsen för Strategisk Forskning
Publisher
Royal Society of Chemistry (RSC)
Subject
Inorganic Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2022/DT/D1DT03748J
Reference46 articles.
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2. Influence of annealing temperature on structural properties of ITO thin-films on graphite substrate
3. Electrical and optical properties of reactively evaporated indium tin oxide (ITO) films-dependence on substrate temperature and tin concentration
4. Electrical, optical, and structural properties of indium–tin–oxide thin films for organic light-emitting devices
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