Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells-Reference-Cited by-同舟云学术

Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells

Published:2019 Issue:40 Volume:7 Page:12532-12543
ISSN:2050-7526
Container-title:Journal of Materials Chemistry C
language:en
Short-container-title:J. Mater. Chem. C

Author:

Koushik Dibyashree¹²³⁴^ORCID,Jošt Marko⁵⁶⁷⁸^ORCID,Dučinskas Algirdas¹²³⁴,Burgess Claire¹²³⁴,Zardetto Valerio⁹¹⁰⁴,Weijtens Christ¹²³⁴,Verheijen Marcel A.¹²³⁴¹¹,Kessels Wilhelmus M. M.¹²³⁴⁹^ORCID,Albrecht Steve⁵⁶⁷⁸¹²,Creatore Mariadriana¹²³⁴⁹^ORCID

Affiliation:

1. Department of Applied Physics

2. Eindhoven University of Technology

3. 5600 MB Eindhoven

4. The Netherlands

5. Young Investigator Group Perovskite Tandem Solar Cells

6. Helmholtz-Zentrum Berlin für Materialien und Energie GmbH

7. 12489 Berlin

8. Germany

9. Solliance Solar Research

10. 5656 AE Eindhoven

11. Eurofins Materials Science BV

12. Technical University Berlin

Abstract

Careful interface design and engineering are “keys” to effectively implement a conformal 10 nm plasma-assisted atomic-layer-deposited NiO film as hole transport layer in a p–i–n perovskite solar cell architecture.

Funder

Bundesministerium für Bildung und Forschung

Ministerie van Economische Zaken

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2019/TC/C9TC04282B

Reference70 articles.

1. NREL. Best Research-Cell Efficiencies http://www.nrel.gov/ncpv/images/efficiency_chart.jpg (accessed May 23, 2019)

2. Interfaces in Perovskite Solar Cells