Porous fluorinated polyarylene ether nitrile as ultralow permittivity dielectrics used under humid environment-Reference-Cited by-同舟云学术

Porous fluorinated polyarylene ether nitrile as ultralow permittivity dielectrics used under humid environment

Published:2021 Issue:3 Volume:9 Page:860-868
ISSN:2050-7526
Container-title:Journal of Materials Chemistry C
language:en
Short-container-title:J. Mater. Chem. C

Author:

Wang Lingling¹²³⁴^ORCID,Bai Zhongxiang¹²³⁴^ORCID,Liu Chenchen¹²³⁴,Wei Renbo¹²³⁴^ORCID,Liu Xiaobo¹²³⁴

Affiliation:

1. School of Materials and Energy

2. University of Electronic Science and Technology of China

3. Chengdu, 610054

4. China

Abstract

Porous FPEN films demonstrating ultralow permittivity, excellent mechanical property and durability under humid environment are efficiently fabricated through the delayed phase inversion approach.

Funder

National Natural Science Foundation of China

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2021/TC/D0TC04930A

Reference48 articles.

1. Vapor-deposited zeolitic imidazolate frameworks as gap-filling ultra-low-k dielectrics

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3. A Smart Latent Catalyst Containing o-Trifluoroacetamide Functional Benzoxazine: Precursor for Low Temperature Formation of Very High Performance Polybenzoxazole with Low Dielectric Constant and High Thermal Stability

4. Low Dielectric Constant Polyimide Hybrid Films Prepared by in Situ Blow-Balloon Method

5. Synthesis and evaluation of PVDF–MgTiO3 polymer–ceramic composites for low-k dielectric applications

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