Effect of RF power on the structural, optical and gas sensing properties of RF-sputtered Al doped ZnO thin films

Author:

Srinatha N.1234,No Y. S.56789,Kamble Vinayak B.1011124,Chakravarty Sujoy13144,Suriyamurthy N.1516174,Angadi Basavaraj1234,Umarji A. M.1819204,Choi W. K.56789

Affiliation:

1. Department of Physics

2. Bangalore University

3. Bangalore 560 056

4. India

5. Interface Control Research Center

6. Future Convergence Research Division

7. Korea Institute of Science and Technology

8. Seoul 136-701

9. Republic of Korea

10. School of Physics

11. Indian Institute of Science Education and Research

12. Thiruvananthapuram 695016

13. UGC-DAE Consortium for Scientific Research

14. Kokilamedu-603104

15. Radiological Safety Division

16. Indira Gandhi Centre for Atomic Research

17. Kalpakkam 603102

18. Materials Research Centre

19. Indian Institute of Science

20. Bangalore-560 067

Abstract

The effect of Radio Frequency (RF) power on the properties of magnetron sputtered Al doped ZnO thin films and the related sensor properties are investigated.

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

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