Effect of annealing on the interface formation in Mo/Be multilayer structures without/with a barrier layer
Author:
Affiliation:
1. Institute of Physics, St-Petersburg State University, Ulyanovskaya Str. 1, Peterhof 198504, St. Petersburg, Russia
2. Institute for Physics of Microstructure, Russian Academy of Sciences, Nizhny Novgorod, 603087, Russia
Abstract
Funder
Russian Foundation for Basic Research
Saint Petersburg State University
Publisher
Royal Society of Chemistry (RSC)
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Link
http://pubs.rsc.org/en/content/articlepdf/2021/CP/D1CP03819B
Reference28 articles.
1. Extreme ultraviolet lithography: A review
2. Extreme ultraviolet lithography
3. Extreme ultraviolet lithography and three dimensional integrated circuit—A review
4. Extreme ultraviolet resist materials for sub-7 nm patterning
5. Lithography for now and the future
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