A hybrid resist hemispherical-pit array layer for light trapping in thin film silicon solar cells via UV nanoimprint lithography-Reference-Cited by-同舟云学术

A hybrid resist hemispherical-pit array layer for light trapping in thin film silicon solar cells via UV nanoimprint lithography

Published:2014 Issue:30 Volume:2 Page:6140-6147
ISSN:2050-7526
Container-title:J. Mater. Chem. C
language:en
Short-container-title:J. Mater. Chem. C

Author:

Wangyang Peihua¹²³⁴⁵,Gan Yanchang⁶⁴⁵,Wang Qingkang¹²³⁴⁵,Jiang Xuesong⁶⁴⁵

Affiliation:

1. Key Laboratory for Thin Film and Microfabrication Technology of Ministry of Education

2. Department of Microelectronics and Nanoscience

3. School of Electronic Information and Electrical Engineering

4. Shanghai Jiao Tong University

5. Shanghai 200240, P.R. China

6. School of Chemistry and Chemical Engineering

Abstract

Micromorph tandem solar cells coated with a HP array layer were fabricated by UV NIL. The HP array layer could reduce the average reflectance of the solar cells from 7.7% to 1.8%. And a relative improvement of efficiency of up to 4.1% is observed as compared to the bare solar cells.

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2014/TC/C4TC00605D

Reference43 articles.

1. Aligned Si nanowire-based solar cells

2. Photon management in nanostructured solar cells

3. TCO and light trapping in silicon thin film solar cells

4. Nanoimprint Lithography for High-Efficiency Thin-Film Silicon Solar Cells

5. Nanoimprint patterning for tunable light trapping in large-area silicon solar cells

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