Transfer the multiscale texture of crystalline Si onto thin-film micromorph cell by UV nanoimprint for light trapping-Reference-Cited by-同舟云学术

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Transfer the multiscale texture of crystalline Si onto thin-film micromorph cell by UV nanoimprint for light trapping

Published:2018-05 Issue: Volume:439 Page:168-175
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Liu Daiming,Wang Qingkang,Wang Qing

Funder

State High-Tech Development Plan of China

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference31 articles.

1. Nanoimprint patterning for tunable light trapping in large-area silicon solar cells;Bessonov;Sol. Energy Mater. Sol. Cells,2011

2. Thin-film silicon solar cell technology;Shah;Prog. Photovolt. Res. Appl.,2004

3. Latest developments of high-efficiency micromorph tandem silicon solar cells implementing innovative substrate materials and improved cell design;Meillaud;IEEE J. Photovolt.,2012

4. Enhancing solar cell efficiency: the search for luminescent materials as spectral converters;Huang;Chem. Soc. Rev.,2013

5. Coherent light trapping in thin-film photovoltaics;Basu Mallick;MRS Bull.,2011

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1. Enhancing efficiency in a-Si:H/μc-Si micromorph tandem solar cells through advanced light-trapping techniques using ARC, TRJ, and DBR;Journal of Materials Science: Materials in Engineering;2024-09-07

2. Fabrication of light trapping structures specialized for near-infrared light by nanoimprinting for the application to thin crystalline silicon solar cells;Discover Nano;2023-05-03

3. Fabrication of light trapping structures specialized for near- infrared light by nanoimprinting for the application to thin crystalline silicon solar cells;2023-02-13

4. A Facile Way of Surface Texturing of Si{100} using KOH for Silicon Solar Cells;2021 Symposium on Design, Test, Integration & Packaging of MEMS and MOEMS (DTIP);2021-08-25

5. Nanoimprint lithography for high-throughput fabrication of metasurfaces;Frontiers of Optoelectronics;2021-04-13

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