ZIF-8 thin films by a vapor-phase process: limits to growth-Reference-Cited by-同舟云学术

ZIF-8 thin films by a vapor-phase process: limits to growth

Published:2023 Issue:15 Volume:15 Page:7115-7125
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Perrot Virginie¹²,Roussey Arthur³,Benayad Anass³,Veillerot Marc¹,Mariolle Denis¹,Solé-Daura Albert⁴,Mellot-Draznieks Caroline⁴^ORCID,Ricoul Florence¹,Canivet Jérôme²^ORCID,Quadrelli Elsje Alessandra²^ORCID,Jousseaume Vincent¹^ORCID

Affiliation:

1. Univ. Grenoble Alpes, CEA, LETI, F-38000 Grenoble, France

2. University of Lyon, Institut de Chimie de Lyon, IRCELYON UMR 5256–CNRS–Université Lyon 1, Institut de recherche sur la catalyse et l'environnement, Villeurbanne, France

3. Univ. Grenoble Alpes, CEA, LITEN, F-38000 Grenoble, France

4. Laboratoire de Chimie des Processus Biologiques, UMR CNRS 8229, Collège de France, Sorbonne Université, PSL Research University, 11 Place Marcelin Berthelot, 75231 Paris Cedex 05, France

Abstract

An improved gas phase process using cyclic ligand/water exposures allows to reach high thickness of ZIF-8. Combination of surface analyses and molecular dynamics calculations highlights the importance of defects in the growth mechanism.

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2023/NR/D3NR00404J

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