Nonlinear imaging microscopy for assessing structural and photochemical modifications upon laser removal of dammar varnish on photosensitive substrates-Reference-Cited by-同舟云学术

Nonlinear imaging microscopy for assessing structural and photochemical modifications upon laser removal of dammar varnish on photosensitive substrates

Published:2017 Issue:34 Volume:19 Page:22836-22843
ISSN:1463-9076
Container-title:Physical Chemistry Chemical Physics
language:en
Short-container-title:Phys. Chem. Chem. Phys.

Author:

Oujja M.¹²³⁴,Psilodimitrakopoulos S.⁵⁶⁷⁸,Carrasco E.¹²³⁴,Sanz M.¹²³⁴,Philippidis A.⁵⁶⁷⁸,Selimis A.⁵⁶⁷⁸,Pouli P.⁵⁶⁷⁸,Filippidis G.⁵⁶⁷⁸^ORCID,Castillejo M.¹²³⁴^ORCID

Affiliation:

1. Instituto de Química Física Rocasolano

2. IQFR-CSIC

3. 28006 Madrid

4. Spain

5. Institute of Electronic Structure and Laser (IESL)

6. Foundation for Research and Technology-Hellas (FORTH)

7. Heraklion

8. Greece

Abstract

Nonlinear optical microscopy imaging serves to characterize the in-depth morphological and photochemical modifications induced by pulsed UV laser removal of dammar varnish applied on a photosensitive substrate.

Publisher

Royal Society of Chemistry (RSC)

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Link

http://pubs.rsc.org/en/content/articlepdf/2017/CP/C7CP02509B

Reference32 articles.

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3. Recent Studies of Laser Science in Paintings Conservation and Research

4. UV laser removal of varnish on tempera paints with nanosecond and femtosecond pulses

5. Practical issues in laser cleaning of stone and painted artefacts: optimisation procedures and side effects

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