Nanoscale compositional segregation in epitaxial AlScN on Si (111)

Author:

Zhang Xiaoman1,Stach Eric A.23ORCID,Meng W. J.1,Meng Andrew C.4ORCID

Affiliation:

1. Mechanical and Industrial Engineering Dept., Louisiana State University, Baton Rouge, LA, USA, 70803

2. Materials Science and Engineering Dept., University of Pennsylvania, Philadelphia, PA, USA, 19104

3. Laboratory for Research on the Structure of Matter, University of Pennsylvania, Philadelphia, Pennsylvania, USA, 19104

4. Physics and Astronomy Dept., University of Missouri, Columbia, MO, USA, 65211

Abstract

We report the growth of epitaxial wurtzite AlScN thin films on Si (111) substrates with a wide range of Sc concentrations using ultra-high vacuum reactive sputtering.

Funder

National Science Foundation

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

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