High-performance vertical GaN-based near-ultraviolet light-emitting diodes on Si substrates
Author:
Affiliation:
1. State Key Laboratory of Luminescent Materials and Devices
2. South China University of Technology
3. Guangzhou 510641
4. China
5. Guangdong Choicore Optoelectronics Co., Ltd
6. Heyuan 517003
Abstract
High-performance vertical GaN-based near-ultraviolet (UV) light-emitting diodes (LEDs) on Si substrates with an electroluminescence emission wavelength of 395 nm have been fabricated by designing epitaxial structures to reduce the dislocation density and enhance the electron confinement and hole injection.
Funder
China Postdoctoral Science Foundation
National Natural Science Foundation of China
Publisher
Royal Society of Chemistry (RSC)
Subject
Materials Chemistry,General Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2018/TC/C8TC04477E
Reference32 articles.
1. High-performance GaN-based light emitting diodes grown on 8-inch Si substrate by using a combined low-temperature and high-temperature-grown AlN buffer layer
2. Light output improvement of GaN-based light-emitting diodes grown on Si (111) by a via-thin-film structure
3. Performance-improved vertical GaN-based light-emitting diodes on Si substrates through designing the epitaxial structure
4. Efficiency improvement of GaN-on-silicon thin-film light-emitting diodes with optimized via-like n-electrodes
5. Prospects of III-nitride optoelectronics grown on Si
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