Morphological dependence on the addition of a soft middle block segment to rigid POSS-containing triblock copolymers for forming cylindrical nanostructures-Reference-Cited by-同舟云学术

Morphological dependence on the addition of a soft middle block segment to rigid POSS-containing triblock copolymers for forming cylindrical nanostructures

Published:2016 Issue:67 Volume:6 Page:62172-62180
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Kato Fuminobu¹²³⁴⁵,Chandra Alvin¹²³⁴⁵,Horiuchi Shin⁶⁷⁸⁵,Hayakawa Teruaki¹²³⁴⁵

Affiliation:

1. Department of Materials Science and Engineering

2. School of Materials and Chemical Technology

3. Tokyo Institute of Technology

4. Tokyo 152-8552

5. Japan

6. Nanomaterials Research Institute

7. National Institute of Advanced Industrial Science and Technology (AIST)

8. Tsukuba 305-8565

Abstract

A series of novel polyhedral oligomelic silsesquioxane (POSS)-containing triblock copolymers that self-assemble into hexagonally-packed cylinders of the POSS domain in a polystyrene (PS) matrix was developed in this study.

Funder

Japan Science and Technology Agency

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2016/RA/C6RA11113K

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