Diffusion doping route to plasmonic Si/SiOx nanoparticles-Reference-Cited by-同舟云学术

Diffusion doping route to plasmonic Si/SiOx nanoparticles

Published:2018 Issue:34 Volume:8 Page:18896-18903
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Bubenov Sergei S.¹²³⁴^ORCID,Dorofeev Sergey G.¹²³⁴^ORCID,Eliseev Andrei A.¹²³⁴⁵^ORCID,Kononov Nikolay N.⁶⁷³⁴,Garshev Alexey V.¹²³⁴⁵,Mordvinova Natalia E.¹²³⁴⁸^ORCID,Lebedev Oleg I.⁸⁹¹⁰¹¹¹²

Affiliation:

1. Department of Chemistry

2. Lomonosov Moscow State University

3. Moscow 119991

4. Russia

5. Department of Materials Science

6. Prokhorov General Physics Institute

7. Russian Academy of Sciences

8. Laboratoire CRISMAT

9. UMR6508

10. CNRS-ENSICAEN

11. Caen 14050

12. France

Abstract

An electrically active impurity was introduced into Si/SiO_x nanoparticles with high temperature annealing in phosphorus vapor.

Funder

Russian Foundation for Basic Research

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2018/RA/C8RA03260B

Reference57 articles.

1. PbSe Nanocrystal Solids for n- and p-Channel Thin Film Field-Effect Transistors

2. Solution-Processed Transistors Using Colloidal Nanocrystals with Composition-Matched Molecular “Solders”: Approaching Single Crystal Mobility

3. Cu2ZnSnS4xSe4(1–x) Solar Cells from Polar Nanocrystal Inks

4. Thermoelectric effect in laser annealed printed nanocrystalline silicon layers

5. Shedding Light on Vacancy-Doped Copper Chalcogenides: Shape-Controlled Synthesis, Optical Properties, and Modeling of Copper Telluride Nanocrystals with Near-Infrared Plasmon Resonances

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