Wafer-scale and deterministic patterned growth of monolayer MoS2via vapor–liquid–solid method

Author:

Li Shisheng12345ORCID,Lin Yung-Chang6784ORCID,Liu Xu-Ying12349ORCID,Hu Zehua101112,Wu Jing13141512,Nakajima Hideaki6784,Liu Song1617181920ORCID,Okazaki Toshiya21784ORCID,Chen Wei101112ORCID,Minari Takeo52349,Sakuma Yoshiki22234,Tsukagoshi Kazuhito5234,Suenaga Kazu6784,Taniguchi Takaaki5234,Osada Minoru523423

Affiliation:

1. International Center for Young Scientists (ICYS)

2. National Institute for Materials Science (NIMS)

3. Tsukuba 305-0044

4. Japan

5. WPI International Center for Materials Nanoarchitectonics (WPI-MANA)

6. Nanomaterials Research Institute

7. National Institute of Advanced Industrial Science and Technology

8. Tsukuba 305-8564

9. Center for Functional Sensor & Actuator (CFSN)

10. Centre for Advanced 2D Materials and Department of Physics

11. National University of Singapore

12. Singapore

13. Institute of Materials Research and Engineering (IMRE)

14. Agency for Science

15. Technology and Research (A*STAR)

16. Institute of Chemical Biology and Nanomedicine (ICBN)

17. College of Chemistry and Chemical Engineering

18. Hunan University

19. Changsha 410082

20. P. R. China

21. CNT-Application Research Center

22. Research Center for Functional Materials

23. Institute of Materials and Systems for Sustainability (iMaSS)

Abstract

2-Inch-wafer-scale MoS2 films and patterned MoS2 monolayers were achieved via a vapor-liquid-solid growth using non-volatile precursors.

Funder

Japan Society for the Promotion of Science

Ministry of Education - Singapore

Ministry of Education, Culture, Sports, Science and Technology

National Institute for Materials Science

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

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