ALD/MLD processes for Mn and Co based hybrid thin films
Author:
Affiliation:
1. Laboratory of Inorganic Chemistry
2. Department of Chemistry
3. Aalto University
4. FI-00076 Aalto
5. Espoo
Abstract
New types of transition metal–organic hybrid thin films are fabricated with the emerging atomic/molecular layer deposition (ALD/MLD) technique through sequential gas-surface reactions from Mn(thd)3, Co(thd)2, Co(acac)3 and terephthalic acid (1,4-benzenedicarboxylic acid) precursors.
Funder
European Research Council
Publisher
Royal Society of Chemistry (RSC)
Subject
Inorganic Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2016/DT/C6DT00851H
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