A novel fabrication technique for high-aspect-ratio nanopillar arrays for SERS application-Reference-Cited by-同舟云学术

A novel fabrication technique for high-aspect-ratio nanopillar arrays for SERS application

Published:2020 Issue:73 Volume:10 Page:45037-45041
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Duan Tianli¹²³⁴^ORCID,Gu Chenjie⁵⁶⁷⁴,Ang Diing Shenp⁸⁹¹⁰,Xu Kang¹¹²³⁴,Liu Zhihong¹²¹³¹⁴⁴

Affiliation:

1. SUSTech Core Research Facilities

2. Southern University of Science and Technology

3. Shenzhen 518055

4. China

5. Institute of Photonics

6. Ningbo University

7. Ningbo 315211

8. School of Electrical and Electronic Engineering

9. Nanyang Technological University

10. Singapore 639798

11. Department of Mechanical and Energy Engineering

12. School of Microelectronics

13. Xidian University

14. Xian 710071

Abstract

A novel technique is demonstrated for the fabrication of silicon nanopillar arrays with high aspect ratios.

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2020/RA/D0RA09145F

Reference25 articles.

1. Silicon Nanopillars for Field-Enhanced Surface Spectroscopy

2. N. P.Reddy , S.Naureen , F.Wang , K.Vora , N.Shahid , F.Karouta , H. H.Tan and C.Jagadish , Fabrication and photoluminescence studies of GaN nanopillars , in 2014 Conference on Optoelectronic and Microelectronic Materials & Devices, 14-17 Dec. 2014 , 2014 , pp. 133–135

3. Improved SERS Performance from Au Nanopillar Arrays by Abridging the Pillar Tip Spacing by Ag Sputtering

4. Surface Plasmon-Enhanced Nanopillar Photodetectors

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