Three-dimensional inverse design of nanopatterns with block copolymers and homopolymers-Reference-Cited by-同舟云学术

Three-dimensional inverse design of nanopatterns with block copolymers and homopolymers

Published:2016 Issue:9 Volume:8 Page:5235-5244
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Xu Dan¹²³⁴,Liu Hong¹²³⁴⁵,Zhu You-Liang⁶⁷⁸⁹,Lu Zhong-Yuan¹²³⁴

Affiliation:

1. Institute of Theoretical Chemistry

2. State Key Laboratory of Supramolecular Structure and Materials

3. Jilin University

4. Changchun 130021, China

5. Eduard-Zintl-Institut für Anorganische und Physikalische Chemie

6. State Key Laboratory of Polymer Physics and Chemistry

7. Changchun Institute of Applied Chemistry

8. Chinese Academy of Sciences

9. Changchun 130022, China

Abstract

We propose a facile inverse design strategy to generate 3D nanopatterns by using either block copolymers or a binary homopolymer blendviadissipative particle dynamics simulations.

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2016/NR/C5NR07497E

Reference59 articles.

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4. Enhancing the Potential of Block Copolymer Lithography with Polymer Self-Consistent Field Theory Simulations

5. Remediation of Line Edge Roughness in Chemical Nanopatterns by the Directed Assembly of Overlying Block Copolymer Films

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