High-κ polymers of intrinsic microporosity: a new class of high temperature and low loss dielectrics for printed electronics-Reference-Cited by-同舟云学术

High-κ polymers of intrinsic microporosity: a new class of high temperature and low loss dielectrics for printed electronics

Published:2020 Issue:2 Volume:7 Page:592-597
ISSN:2051-6347
Container-title:Materials Horizons
language:en
Short-container-title:Mater. Horiz.

Author:

Zhang Zhongbo¹²³^ORCID,Zheng Jifu⁴⁵⁶⁷⁸^ORCID,Premasiri Kasun⁹²¹⁰³^ORCID,Kwok Man-Hin¹²³,Li Qiong¹²³,Li Ruipeng¹¹¹²¹³³^ORCID,Zhang Suobo⁴⁵⁶⁷⁸^ORCID,Litt Morton H.¹²³,Gao Xuan P. A.⁹²¹⁰³^ORCID,Zhu Lei¹²³^ORCID

Affiliation:

1. Department of Macromolecular Science and Engineering

2. Case Western Reserve University

3. USA

4. Key Laboratory of Ecomaterials

5. Changchun Institute of Applied Chemistry

6. Chinese Academy of Sciences

7. Changchun 130022

8. P. R. China

9. Department of Physics

10. Cleveland

11. National Synchrotron Light Source II

12. Brookhaven National Laboratory

13. Upton

Abstract

For the first time, sulfonylated polymers of intrinsic microporosity (PIMs) are exploited for high-κ, high-temperature, and low-loss gate dielectric applications.

Funder

Office of Science

Division of Materials Research

Publisher

Royal Society of Chemistry (RSC)

Subject

Electrical and Electronic Engineering,Process Chemistry and Technology,Mechanics of Materials,General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2020/MH/C9MH01261C

Reference44 articles.

1. Exploring Strategies for High Dielectric Constant and Low Loss Polymer Dielectrics

2. Recent Progress on Ferroelectric Polymer-Based Nanocomposites for High Energy Density Capacitors: Synthesis, Dielectric Properties, and Future Aspects