High-resolution and large-area nanoparticle arrays using EUV interference lithography-Reference-Cited by-同舟云学术

High-resolution and large-area nanoparticle arrays using EUV interference lithography

Published:2015 Issue:16 Volume:7 Page:7386-7393
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Karim Waiz¹²³⁴⁵^ORCID,Tschupp Simon Andreas⁶²³,Oezaslan Mehtap⁶²³⁷⁸,Schmidt Thomas J.⁶²³⁹⁵,Gobrecht Jens¹²³,van Bokhoven Jeroen A.⁴⁵¹⁰²³,Ekinci Yasin¹²³

Affiliation:

1. Laboratory for Micro and Nanotechnology

2. Paul Scherrer Institute

3. 5232 Villigen-PSI, Switzerland

4. Institute for Chemical and Bioengineering

5. ETH Zurich, Switzerland

6. Electrochemistry Laboratory

7. Department of Chemistry

8. Carl von Ossietzky Universität Oldenburg

9. Laboratory of Physical Chemistry

10. Laboratory for Catalysis and Sustainable Chemistry

Abstract

Step-and-repeat EUV–ATL to obtain large-area nanoparticle arrays.

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2015/NR/C5NR00565E

Reference37 articles.

1. Photophysical, Photochemical and Photocatalytic Aspects of Metal Nanoparticles

2. The Optical Properties of Metal Nanoparticles: The Influence of Size, Shape, and Dielectric Environment

3. Some Interesting Properties of Metals Confined in Time and Nanometer Space of Different Shapes

4. Chemical Synthesis of Novel Plasmonic Nanoparticles

5. Shape-Controlled Synthesis of Gold and Silver Nanoparticles

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