Formation mechanism and optical characterization of polymorphic silicon nanostructures by DC arc-discharge-Reference-Cited by-同舟云学术

Formation mechanism and optical characterization of polymorphic silicon nanostructures by DC arc-discharge

Published:2015 Issue:84 Volume:5 Page:68714-68721
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Yu Jieyi¹²³⁴⁵,Gao Jian¹²³⁴⁵,Xue Fanghong¹²³⁴⁵,Yu Xiuhong¹²³⁴⁵^ORCID,Yu Hongtao⁶⁷⁴⁸⁹,Dong Xinglong¹²³⁴⁵,Huang Hao¹²³⁴⁵,Ding Ang¹²³⁴⁵,Quan Xie⁶⁷⁴⁸⁹,Cao Guozhong¹⁰¹¹¹²¹³

Affiliation:

1. Key Laboratory of Materials Modification by Laser

2. Ion and Electron Beams (Ministry of Education)

3. School of Materials Science and Engineering

4. Dalian University of Technology

5. Dalian 116023

6. Key Laboratory of Industrial Ecology and Environmental Engineering (Ministry of Education)

7. School of Environmental Science and Technology

8. Dalian

9. China

10. Department of Materials Science and Engineering

11. University of Washington

12. Seattle

13. USA

Abstract

Polymorphic Si nanostructures (particle, sheet, ribbon) are generated through isotropic, anisotropic, and coalescence growth using a DC arc-discharge plasma method.

Funder

National Natural Science Foundation of China

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2015/RA/C5RA11738K

Reference54 articles.

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2. Porous silicon biosensor: Current status

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4. Directly modulated and fully tunable hybrid silicon lasers for future generation of coherent colorless ONU

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