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Thin film depth profiling by ion beam analysis

Published:2016 Issue:21 Volume:141 Page:5944-5985
ISSN:0003-2654
Container-title:The Analyst
language:en
Short-container-title:Analyst

Author:

Jeynes Chris¹²³^ORCID,Colaux Julien L.¹²³

Affiliation:

1. University of Surrey Ion Beam Centre

2. Guildford

3. UK

Abstract

The analysis of thin films is of central importance for functional materials, including the very large and active field of nanomaterials.

Publisher

Royal Society of Chemistry (RSC)

Subject

Electrochemistry,Spectroscopy,Environmental Chemistry,Biochemistry,Analytical Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2016/AN/C6AN01167E

Reference263 articles.

1. Chemical Analysis of Surfaces by Nuclear Methods

2. Accurate depth profiling of complex optical coatings

3. Elemental thin film depth profiles by ion beam analysis using simulated annealing - a new tool

4. “Total IBA” – Where are we?

5. LXXIX. The scattering of α and β particles by matter and the structure of the atom

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