Electronic structure of the ground and excited states of neutral and charged silicon hydrides, SiHx0/+/−, x = 1–4
Author:
Affiliation:
1. Department of Chemistry and Biochemistry, Auburn University, Auburn, AL 36849-5312, USA
2. Department of Chemical Engineering, Auburn University, Auburn, AL 36849-5312, USA
Abstract
Funder
Auburn University
Publisher
Royal Society of Chemistry (RSC)
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Link
http://pubs.rsc.org/en/content/articlepdf/2022/CP/D2CP00956K
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1. Nanodusty plasma chemistry: a mechanistic and variational transition state theory study of the initial steps of silyl anion–silane and silylene anion–silane polymerization reactions
2. Particle nucleation and growth in dusty plasmas: On the importance of charged-neutral interactions
3. Production of higher silanes in radio frequency SiH4 and H2-SiH4 plasmas
4. A model for the discharge kinetics and plasma chemistry during plasma enhanced chemical vapor deposition of amorphous silicon
5. Synthesis of Silicon Nanoparticles in Nonthermal Capacitively-Coupled Flowing Plasmas: Processes and Transport
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