Conformal growth of copper sulfide thin films on highly textured surface via microreactor-assisted solution deposition-Reference-Cited by-同舟云学术

Conformal growth of copper sulfide thin films on highly textured surface via microreactor-assisted solution deposition

Published:2015 Issue:14 Volume:17 Page:2827-2836
ISSN:1466-8033
Container-title:CrystEngComm
language:en
Short-container-title:CrystEngComm

Author:

Vas-Umnuay Paravee¹²³⁴⁵,Kim Ki-Joong¹²³,Kim Dae-Hwan⁶⁷⁸,Chang Chih-Hung¹²³

Affiliation:

1. School of Chemical, Biological & Environmental Engineering

2. Oregon State University

3. Corvallis, USA

4. Department of Chemical Engineering

5. Faculty of Engineering

6. Green Energy Research Division

7. Daegu Gyeongbuk Institute of Science & Technology

8. Daegu 711-873, South Korea

Abstract

In this work, the preparation of copper sulfide (Cu_xS) thin films via microreactor-assisted solution deposition (MASD), consisting of separation of the homogeneous reaction and deposition from the molecular level heterogeneous surface reaction, is demonstrated.

Publisher

Royal Society of Chemistry (RSC)

Subject

Condensed Matter Physics,General Materials Science,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2015/CE/C4CE02374A

Reference50 articles.

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4. Fast and Scalable Printing of Large Area Monolayer Nanoparticles for Nanotexturing Applications

5. Solar cell with extremely thin absorber on highly structured substrate

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