Microreactor assisted soft lithography of nanostructured antimony sulfide thin film patterns: nucleation, growth and application in solid state batteries-Reference-Cited by-同舟云学术

Microreactor assisted soft lithography of nanostructured antimony sulfide thin film patterns: nucleation, growth and application in solid state batteries

Published:2024 Issue:9 Volume:3 Page:2200-2211
ISSN:2753-1457
Container-title:Energy Advances
language:en
Short-container-title:Energy Adv.

Author:

Chun Bryan¹,Doddapaneni V. Vinay K.²^ORCID,Lucero Marcos²,Pan Changqing²^ORCID,Gao Zhongwei²,Feng Zhenxing²^ORCID,Malhotra Rajiv³,Chang Chih-hung²^ORCID

Affiliation:

1. School of Mechanical, Industrial and Manufacturing Engineering, Oregon State University, Corvallis, OR 97331, USA

2. School of Chemical, Biological and Environmental Engineering, Oregon State University, Corvallis, OR 97331, USA

3. Department of Mechanical & Aerospace Engineering, Rutgers University, Piscataway, NJ 08854, USA

Abstract

This study explores the microreactor-assisted soft lithography (MASL) method for direct, one-step synthesis and patterning of additive-free antimony sulfide (Sb2S3) nanostructured thin films.

Funder

National Science Foundation

Walmart

Publisher

Royal Society of Chemistry (RSC)

Link

http://pubs.rsc.org/en/content/articlepdf/2024/YA/D4YA00436A

Reference51 articles.

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2. Present Status and Future Perspective of Antimony Chalcogenide (Sb₂X₃) Photovoltaics

3. Defect engineering in antimony selenide thin film solar cells

4. Colloidal Antimony Sulfide Nanoparticles as a High-Performance Anode Material for Li-ion and Na-ion Batteries

5. Enhanced hydrothermal heterogeneous deposition with surfactant additives for efficient Sb2S3 solar cells