Incompletely condensed POSS-based spin-on-glass networks for impeccable ultra low-k integration
Author:
Affiliation:
1. Materials Architecturing Research Center
2. Korea Institute of Science and Technology
3. Seong-Buk Gu
4. Republic of Korea
5. Nanomaterials Science and Engineering
Abstract
The integration reliability of mechanically robust, ultra low-k spin-on-glass poly(methyl)silsesquioxanes incorporating incompletely condensed methyl-POSS were examined for next generation microelectronics.
Publisher
Royal Society of Chemistry (RSC)
Subject
Materials Chemistry,General Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2015/TC/C5TC02683K
Reference26 articles.
1. Application of the Protection/Deprotection Strategy to the Science of Porous Materials
2. High-performance ultralow dielectric constant carbon-bridged mesoporous organosilica films for advanced interconnects
3. Low Dielectric Constant Materials
4. Molecular Network Reinforcement of Sol–Gel Glasses
5. Silsesquioxanes
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