Proximity correction and resolution enhancement of plasmonic lens lithography far beyond the near field diffraction limit

Author:

Luo Yunfei12345,Liu Ling12345,Zhang Wei12345,Kong Weijie12345,Zhao Chengwei12345,Gao Ping12345,Zhao Zeyu12345,Pu Mingbo12345,Wang Changtao12345,Luo Xiangang12345ORCID

Affiliation:

1. State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering

2. Institute of Optics and Electronics

3. Chinese Academy of Sciences

4. Chengdu 610209

5. China

Abstract

The methods for resolution enhancement and proximity correction of plasmonic lens lithography far beyond near field diffraction limit are investigated.

Funder

National Natural Science Foundation of China

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

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