Proximity correction and resolution enhancement of plasmonic lens lithography far beyond the near field diffraction limit-Reference-Cited by-同舟云学术

Proximity correction and resolution enhancement of plasmonic lens lithography far beyond the near field diffraction limit

Published:2017 Issue:20 Volume:7 Page:12366-12373
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Luo Yunfei¹²³⁴⁵,Liu Ling¹²³⁴⁵,Zhang Wei¹²³⁴⁵,Kong Weijie¹²³⁴⁵,Zhao Chengwei¹²³⁴⁵,Gao Ping¹²³⁴⁵,Zhao Zeyu¹²³⁴⁵,Pu Mingbo¹²³⁴⁵,Wang Changtao¹²³⁴⁵,Luo Xiangang¹²³⁴⁵^ORCID

Affiliation:

1. State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering

2. Institute of Optics and Electronics

3. Chinese Academy of Sciences

4. Chengdu 610209

5. China

Abstract

The methods for resolution enhancement and proximity correction of plasmonic lens lithography far beyond near field diffraction limit are investigated.

Funder

National Natural Science Foundation of China

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2017/RA/C7RA00116A

Reference51 articles.

1. Make them Blink: Probes for Super-Resolution Microscopy

2. High‐precision distance measurements and volume‐conserving segmentation of objects near and below the resolution limit in three‐dimensional confocal fluorescence microscopy

3. Near-field infrared imaging of molecular changes in cholesteryl oleate by free electron laser infrared ablation