GaAs nanoscale membranes: prospects for seamless integration of III–Vs on silicon

Author:

Raya Andrés M.12345ORCID,Friedl Martin12345,Martí-Sánchez Sara678910ORCID,Dubrovskii Vladimir G.111213,Francaviglia Luca12345,Alén Benito1415161710,Morgan Nicholas12345,Tütüncüoglu Gözde12345,Ramasse Quentin M.1819202122,Fuster David1415161710,Llorens Jose M.1415161710,Arbiol Jordi678910ORCID,Fontcuberta i Morral Anna12345ORCID

Affiliation:

1. Laboratoire des Matériaux Semiconducteurs

2. Institute of Materials

3. Faculty of Engineering

4. École Polytechnique Fédérale de Lausanne

5. EPFL

6. Catalan Institute of Nanoscience and Nanotechnology (ICN2)

7. CSIC and BIST

8. Campus UAB

9. 08193 Barcelona

10. Spain

11. ITMO University

12. 197101 St. Petersburg

13. Russia

14. Instituto de Micro y Nanotecnología

15. IMN-CNM

16. CSIC (CEI UAM+CSIC)

17. 28760 Tres Cantos

18. SuperSTEM Laboratory

19. SciTech Daresbury Campus

20. Daresbury WA4 4AD

21. UK

22. School of Chemical and Process Engineering

Abstract

Selective area epitaxy of GaAs nanoscale membranes on silicon. Small apertures result in a majority defect-free structures.

Funder

Schweizerischer Nationalfonds zur Förderung der Wissenschaftlichen Forschung

Russian Science Foundation

Ministerio de Economía y Competitividad

Comunidad de Madrid

European Regional Development Fund

“la Caixa” Foundation

Generalitat de Catalunya

Horizon 2020 Framework Programme

Consejo Superior de Investigaciones Científicas

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

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