About the importance of purge time in molecular layer deposition of alucone films-Reference-Cited by-同舟云学术

About the importance of purge time in molecular layer deposition of alucone films

Published:2021 Issue:17 Volume:50 Page:5807-5818
ISSN:1477-9226
Container-title:Dalton Transactions
language:en
Short-container-title:Dalton Trans.

Author:

Jain Hardik¹²³⁴⁵^ORCID,Poodt Paul¹²³⁴⁵

Affiliation:

1. TNO/Holst Centre

2. 5656 AE Eindhoven

3. Netherlands

4. Department of Applied Physics

5. Eindhoven University of Technology

Abstract

In MLD of alucone using trimethylaluminum (TMA) and ethylene glycol (EG), TMA is known to infiltrate into the MLD film taking very long to outgas. An insufficient purge can then lead to an additional CVD component in the overall growth.

Funder

H2020 Marie Skłodowska-Curie Actions

Publisher

Royal Society of Chemistry (RSC)

Subject

Inorganic Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2021/DT/D1DT00623A

Reference53 articles.

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4. Atomic layer deposition—Sequential self-limiting surface reactions for advanced catalyst “bottom-up” synthesis

5. Sequential surface chemical reaction limited growth of high quality Al2O3dielectrics

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