Advancing next generation nanolithography with infiltration synthesis of hybrid nanocomposite resists-Reference-Cited by-同舟云学术

Advancing next generation nanolithography with infiltration synthesis of hybrid nanocomposite resists

Published:2019 Issue:29 Volume:7 Page:8803-8812
ISSN:2050-7526
Container-title:Journal of Materials Chemistry C
language:en
Short-container-title:J. Mater. Chem. C

Author:

Tiwale Nikhil¹²³⁴^ORCID,Subramanian Ashwanth⁵⁶⁷⁴^ORCID,Kisslinger Kim¹²³⁴,Lu Ming¹²³⁴,Kim Jiyoung⁸⁹¹⁰⁴,Stein Aaron¹²³⁴,Nam Chang-Yong¹²³⁴⁵^ORCID

Affiliation:

1. Center for Functional Nanomaterials

2. Brookhaven National Laboratory

3. Upton

4. USA

5. Department of Materials Science and Chemical Engineering

6. Stony Brook University

7. Stony Brook

8. Department of Materials Science and Engineering

9. University of Texas at Dallas

10. Richardson

Abstract

Novel positive-tone hybrid resists developed by vapor-phase inorganic infiltration feature fully tunable resist performance parameters and high-aspect-ratio pattern transfer capability.

Funder

Office of Science

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2019/TC/C9TC02974E

Reference96 articles.

1. Extreme ultraviolet resist materials for sub-7 nm patterning

2. High-index nanocomposite photoresist for 193-nm lithography

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4. Directed self-assembly of block copolymers for use in bit patterned media fabrication

5. Lithography and Other Patterning Techniques for Future Electronics

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