Thickness-dependent structural characteristics for a sputtering-deposited chromium monolayer and Cr/C and Cr/Sc multilayers

Abstract

The interior structure, morphology and ligand surrounding of a sputtering-deposited chromium monolayer and Cr/C and Cr/Sc multilayers are determined by various hard X-ray techniques in order to reveal the growth characteristics of Cr-based thin films. A Cr monolayer presents a three-stage growth mode with sudden changes occurring at a layer thickness of ∼2 nm and beyond 6 nm. Cr-based multilayers are proven to have denser structures due to interfacial diffusion and layer growth mode. Cr/C and Cr/Sc multilayers have different interfacial widths resulting from asymmetry, degree of crystallinity and thermal stability. Cr/Sc multilayers present similar ligand surroundings to Cr foil, whereas Cr/C multilayers are similar to Cr monolayers. The aim of this study is to help understand the structural evolution regulationversuslayer thickness and to improve the deposition technology of Cr-based thin films, in particular for obtaining stable Cr-based multilayers with ultra-short periods.