A unique approach to accurately measure thickness in thick multilayers-Reference-Cited by-同舟云学术

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A unique approach to accurately measure thickness in thick multilayers

Published:2012-03-20 Issue:3 Volume:19 Page:425-427
ISSN:0909-0495
Container-title:Journal of Synchrotron Radiation
language:
Short-container-title:J Synchrotron Radiat

Author:

Shi Bing,Hiller Jon M.,Liu Yuzi,Liu Chian,Qian Jun,Gades Lisa,Wieczorek Michael J.,Marander Albert T.,Maser Jorg,Assoufid Lahsen

Publisher

International Union of Crystallography (IUCr)

Subject

Instrumentation,Nuclear and High Energy Physics,Radiation

Link

http://journals.iucr.org/s/issues/2012/03/00/ie5067/ie5067.pdf

Reference9 articles.

1. Metrology of multilayer Laue lens structures by means of scanning electron microscope imaging

2. High-efficiency diffractive x-ray optics from sectioned multilayers

3. Focusing of hard x-rays to 16 nanometers with a multilayer Laue lens

4. Development of Multilayer Laue Lenses; (1) Linear Type

5. Fabrication of multilayer Laue lenses by a combination of pulsed laser deposition and focused ion beam

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Accurate characterization of a thick multilayer structure using the marking-layer-based scanning electron microscopy method;Journal of Physics D: Applied Physics;2013-06-19

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