High-efficiency Fresnel zone plates for hard X-rays by 100 keV e-beam lithography and electroplating-Reference-Cited by-同舟云学术

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High-efficiency Fresnel zone plates for hard X-rays by 100 keV e-beam lithography and electroplating

Published:2011-03-10 Issue:3 Volume:18 Page:442-446
ISSN:0909-0495
Container-title:Journal of Synchrotron Radiation
language:
Short-container-title:J Synchrotron Radiat

Author:

Gorelick Sergey,Vila-Comamala Joan,Guzenko Vitaliy A.,Barrett Ray,Salomé Murielle,David Christian

Publisher

International Union of Crystallography (IUCr)

Subject

Instrumentation,Nuclear and High Energy Physics,Radiation

Link

http://journals.iucr.org/s/issues/2011/03/00/ve5005/ve5005.pdf

Reference13 articles.

1. Laboratory arrangement for soft x-ray zone plate efficiency measurements

2. Fabrication of high-aspect-ratio Fresnel zone plates by e-beam lithography and electroplating

3. Full-field hard x-ray microscopy below 30 nm: a challenging nanofabrication achievement

4. Nanofabrication of high aspect ratio 24 nm x-ray zone plates for x-ray imaging applications

5. Direct e-beam writing of dense and high aspect ratio nanostructures in thick layers of PMMA for electroplating

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