Spatial intensity profile of an X-ray beam reflected from nearly perfect silicon and diffuse scattering measurements-Reference-Cited by-同舟云学术

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Spatial intensity profile of an X-ray beam reflected from nearly perfect silicon and diffuse scattering measurements

Published:1991-08-01 Issue:4 Volume:24 Page:403-404
ISSN:0021-8898
Container-title:Journal of Applied Crystallography
language:
Short-container-title:J Appl Cryst

Author:

Entin I. R.,Khrupa V. I.

Publisher

International Union of Crystallography (IUCr)

Subject

General Biochemistry, Genetics and Molecular Biology

Link

http://journals.iucr.org/j/issues/1991/04/00/ms0347/ms0347.pdf

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Use of acoustic waves in x-ray topography of silicon crystals;SPIE Proceedings;2004-06-04

2. X-ray acoustic topography of defects in Si crystals;physica status solidi (a);2004-03

3. Formation features of microdefect x-ray topography images in silicon crystals;SPIE Proceedings;1999-11-18

4. Structure Changes in Cz-Si Single Crystals Irradiated with Fast Oxygen and Neon Ions;Acta Physica Polonica A;1999-07

5. Influence of absorption level on mechanisms of bragg-diffracted x-ray beam formation in real silicon crystals;Semiconductor Physics, Quantum Electronics and Optoelectronics;1999-03-22

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