10.4139/sfj.61.578-Reference-Cited by-同舟云学术

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10.4139/sfj.61.578

Published:2010 Issue:8 Volume:61 Page:578-582
ISSN:0915-1869
Container-title:Journal of The Surface Finishing Society of Japan
language:
Short-container-title:Journal of The Surface Finishing Society of Japan

Author:

HATTORI Takeshi

Publisher

The Surface Finishing Society of Japan

Subject

General Engineering

Reference12 articles.

1. 2) T. Hattori ; Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 11, ECS Transactions, 25, (5), p.3 (The Electrochemical Society, 2009).

2. 3) K. Saga and T. Hattori; Solid State Phenomena, 134, 97 (2007).

3. 4) K. Saga, H. Hirano, H. Kuniyasu and T. Hattori ; Proc. CD of the 8^th International Symposium on Supercritical Fluids (ISSF2006) (Kyoto, 2006).

4. 5) K. Saga, H. Kuniyasu, T .Hattori, M. Korzenski, P. Visintin and T. Baum ; Cleaning Technology in Semiconductor Device Manufacturing IX, ECS Transactions, 1, (3), p.277 (The Electrochemical Society, 2005).

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Physical Wet Cleaning Technology for Semiconductor Devices;JAPANESE JOURNAL OF MULTIPHASE FLOW;2023-06-15

2. Development of optical‐driven nanoneedles using SU‐8 nanofabrication;Electronics and Communications in Japan;2022-02-17

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