Atomic layer lithography of wafer-scale nanogap arrays for extreme confinement of electromagnetic waves-Reference-Cited by-同舟云学术

Atomic layer lithography of wafer-scale nanogap arrays for extreme confinement of electromagnetic waves

Published:2013-09-03 Issue:1 Volume:4 Page:
ISSN:2041-1723
Container-title:Nature Communications
language:en
Short-container-title:Nat Commun

Author:

Chen Xiaoshu,Park Hyeong-Ryeol,Pelton Matthew,Piao Xianji,Lindquist Nathan C.,Im Hyungsoon,Kim Yun Jung,Ahn Jae Sung,Ahn Kwang Jun,Park Namkyoo,Kim Dai-Sik,Oh Sang-Hyun

Publisher

Springer Science and Business Media LLC

Subject

General Physics and Astronomy,General Biochemistry, Genetics and Molecular Biology,General Chemistry

Link

http://www.nature.com/articles/ncomms3361.pdf

Reference38 articles.

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5. Kern, J. et al. Atomic-scale confinement of resonant optical fields. Nano Lett. 12, 5504–5509 (2012).

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