Author:
Kizir Seda,van den Beld Wesley T. E.,Schurink Bart,van de Kruijs Robbert W. E.,Benschop Jos P. H.,Bijkerk Fred
Abstract
AbstractThe role of the Mo2C/oxide interface on multi-layer graphene (MLG) nucleation during a chemical vapor deposition (CVD) process is investigated. During the CVD process, MLG growth is only observed in the presence of a Mo2C/SiO2 interface, indicating that the chemical reactions occurring at this interface trigger the nucleation of MLG. The chemical reaction pathway is explained in four steps as (1) creation of H radicals, (2) reduction of the oxide surface, (3) formation of C–C bonds at O–H sites, and (4) expansion of graphitic domains on the Mo2C catalyst. Different Mo2C/oxide interfaces are investigated, with varying affinity for reduction in a hydrogen environment. The results demonstrate a catalyst/oxide bifunctionality on MLG nucleation, comprising of CH4 dehydrogenation by Mo2C and initial C–C bond formation at the oxide interface.
Funder
Nederlandse Organisatie voor Wetenschappelijk Onderzoek
Publisher
Springer Science and Business Media LLC
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