Longitudinal and latitudinal split-gate field-effect transistors for NAND and NOR logic circuit applications

Author:

Lee Minjong,Park Chang Yong,Hwang Do KyungORCID,Kim Min-guORCID,Lee Young TackORCID

Abstract

AbstractTwo-dimensional (2D) materials have been extensively adopted in various device architectures for advanced applications owing to their structural diversity, high functionality, and ease of integration. Among the various architectures, split-gate field-effect transistors (SG-FETs) have been widely studied based on their sequentially located SG electrode along the source/drain electrodes. In this paper, we propose two different homogeneous molybdenum disulfide (MoS2)-based SG-FET structures, namely AND-FET and OR-FET, whose gap directions are perpendicular to each other. It can exhibit AND or OR switching characteristics if it has a longitudinal or latitudinal gapped SG structure, respectively. Moreover, the AND-FET and OR-FET are regarded as folded structures of series and parallel connections of two n-type transistors. By using these switching devices, we successfully demonstrate NAND and NOR logic gates through a single active channel. These approaches are expected to pave the way for the realization of multi-functionality and high integration of 2D material-based future electronic devices.

Funder

National Research Foundation of Korea

Korea Institute of Science and Technology

Publisher

Springer Science and Business Media LLC

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science,General Chemistry

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