Single-Source MOCVD of Fe/Sn Alloy Thin Films
Author:
Affiliation:
1. Department of Chemistry, National Chung Cheng University, Ming-Hsiung, Chia-Yi, Taiwan 621, Republic of China
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/cm010654m
Reference33 articles.
1. Kodas, T.; Hampden-Smith, M.The Chemistry of Metal CVD; VCH Publishers Inc.:Weinheim, Germany, 1994; pp 439−440.
2. CVD of Compound Semiconductors
3. Chemical vapor deposition of iron-cobalt (FeCox) and iron cobalt oxide (FeCoxOy) thin films from iron cobalt carbonyl clusters
4. Photochemical vapor deposition of mixed-metal thin films from organometallic precursors containing heteronuclear metal-metal bonds
5. Chemical Vapor Deposition of Metallic Thin Films Using Homonuclear and Heteronuclear Metal Carbonyls
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