Controlling Surface Functionality through Generation of Thiol Groups in a Self-Assembled Monolayer-Reference-Cited by-同舟云学术

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Controlling Surface Functionality through Generation of Thiol Groups in a Self-Assembled Monolayer

Published:2010-09-16 Issue:20 Volume:26 Page:15895-15900
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Lud Simon Q.¹,Neppl Stefan²,Richter Gerhard³,Bruno Paola⁴,Gruen Dieter M.⁴,Jordan Rainer³⁵,Feulner Peter²,Stutzmann Martin¹,Garrido Jose A.¹

Affiliation:

1. Walter Schottky Institut

2. Physics Department E20

3. Wacker-Lehrstuhl für Makromolekulare Chemie, Department Chemie

4. Materials Science Department, Argonne National Laboratory, Argonne, Illinois 60439, USA

5. Professur für Makromolekulare Chemie, Department Chemie, TU Dresden, 01069 Dresden, Germany

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la102225r

Reference37 articles.

1. Chemical Nanolithography with Electron Beams

2. Nanoscale patterning of self-assembled monolayers with electrons

3. Electron induced chemical nanolithography with self-assembled monolayers

4. Electron-induced crosslinking of aromatic self-assembled monolayers: Negative resists for nanolithography

5. Generation of Surface Amino Groups on Aromatic Self-Assembled Monolayers by Low Energy Electron Beams—A First Step Towards Chemical Lithography

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