Mechanically Tunable Three-Dimensional Elastomeric Network/Air Structures via Interference Lithography-Reference-Cited by-同舟云学术

Mechanically Tunable Three-Dimensional Elastomeric Network/Air Structures via Interference Lithography

Published:2006-03-15 Issue:4 Volume:6 Page:740-743
ISSN:1530-6984
Container-title:Nano Letters
language:en
Short-container-title:Nano Lett.

Author:

Jang Ji-Hyun¹,Ullal Chaitanya K.¹,Gorishnyy Taras¹,Tsukruk Vladimir V.¹,Thomas Edwin L.¹

Affiliation:

1. Institute for Soldier Nanotechnologies, Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, and Department of Materials Science and Engineering, Iowa State University, Ames, Iowa 50011

Publisher

American Chemical Society (ACS)

Subject

Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering

Link

https://pubs.acs.org/doi/pdf/10.1021/nl052577q

Reference28 articles.

1. Soft Lithography

2. Patterned deposition of cells and proteins onto surfaces by using three-dimensional microfluidic systems

3. Poly(dimethylsiloxane) as a Material for Fabricating Microfluidic Devices

4. A Photocurable Poly(dimethylsiloxane) Chemistry Designed for Soft Lithographic Molding and Printing in the Nanometer Regime

5. A Method for Precision Patterning of Silicone Elastomer and Its Applications

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